In situ analysis of thin film deposition process using time of flight (TOF) ion beam analysis methods
โ Scribed by Jaemo Im; Alan R. Krauss; Yuping Lin; J.A. Schultz; Orlando H. Auciello; Dieter M. Gruen; R.P.H. Chang
- Book ID
- 113287240
- Publisher
- Elsevier Science
- Year
- 1996
- Tongue
- English
- Weight
- 836 KB
- Volume
- 118
- Category
- Article
- ISSN
- 0168-583X
No coin nor oath required. For personal study only.
๐ SIMILAR VOLUMES
of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio
of Ti to a few percent. Pre-evaporation of a 300 ,~ thick CaF.~ parting layer allowed membrane removal by water-assisted peeling. Pressure testing showed membranes to have bulk tensile strength of 4.6-6.2,'< l09 dyn/cm 2 (68-92 kpsi) and to behave elastically. They could be mounted under high tensio