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Impurity activated whisker growth of zirconium nitride by chemical vapour deposition

โœ Scribed by Seiji Motojima; Eiji Kani; Yasutaka Takahashi; Kohzo Sugiyama

Book ID
104803404
Publisher
Springer
Year
1979
Tongue
English
Weight
887 KB
Volume
14
Category
Article
ISSN
0022-2461

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Filament-activated chemical vapour depos
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โœ Sadanand V. Deshpande; Jeffrey L. Dupuie; Erdogan Gulari ๐Ÿ“‚ Article ๐Ÿ“… 1996 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 987 KB

We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tun