Improving reliability of poly-Si TFTs with channel layer and gate oxide passivated by NH3/N2O plasma

✍ Scribed by Xiangbin Zeng; X.W. Sun; Junfeng Li; Johnny K.O. Sin

• Book ID: 104057739
• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 334 KB
• Volume: 44
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/j.microrel.2003.10.007