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Improvements in the 860A Cs sputter source for high energy ion implantation

✍ Scribed by Jiao Gui-Yue

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 387 KB
Volume: 45
Category: Article
ISSN: 0042-207X
DOI: 10.1016/0042-207x(94)90218-6

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