Improvement of the electrical properties of PECVD silicon oxide using high-density and low-ion-energy plasma post-treatment

✍ Scribed by Chuan Jie Zhong; Hiroaki Tanaka; Shigetoshi Sugawa; Tadahiro Ohmi

• Book ID: 116668708
• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 162 KB
• Volume: 351
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/j.jnoncrysol.2005.06.016