Comparison of electric properties of ultra-thin thermal and plasma nitrided silicon oxides with different post-deposition treatments using C-AFM

✍ Scribed by W. Polspoel; W. Vandervorst; J. Pétry; T. Conard; A. Benedetti

• Book ID: 108207485
• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 933 KB
• Volume: 80
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2005.04.102