✦ LIBER ✦
Comparison of equivalent oxide thickness and electrical properties of atomic layer deposited hafnium zirconate dielectrics with thermal or decoupled plasma nitridation process
✍ Scribed by Chen-Kuo Chiang, Chien-Hung Wu, Chin-Chien Liu, Jin-Fu Lin, Chien-Lun Yang, Jiun-Yuan Wu, Shui-Jinn Wang
- Book ID
- 118303716
- Publisher
- The Korean Institute of Metals and Materials
- Year
- 2012
- Tongue
- English
- Weight
- 598 KB
- Volume
- 8
- Category
- Article
- ISSN
- 1738-8090
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