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Improvement of silicon etching resolution using the confined etchant layer technique

✍ Scribed by Yanbing Zu; Lei Xie; Zhaowu Tian; Zhaoxiong Xie; Jiqian Mu; Bingwei Mao

Book ID: 105641071
Publisher: Springer
Year: 1997
Tongue: English
Weight: 146 KB
Volume: 42
Category: Article
ISSN: 1001-6538
DOI: 10.1007/bf02882770

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