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A Comparative Study on Electrochemical Micromachining of n-GaAs and p-Si by Using Confined Etchant Layer Technique

โœ Scribed by Zhang, Li; Ma, Xin Z.; Lin, Mi X.; Lin, Yu; Cao, Guo H.; Tang, Jing; Tian, Zhao W.


Book ID
126941322
Publisher
American Chemical Society
Year
2006
Tongue
English
Weight
464 KB
Volume
110
Category
Article
ISSN
0022-3654

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## Abstract The structural properties of 2โ€‰ยตm thick Nโ€face InN film, grown on Si (111) by plasma source molecular beam epitaxy after the initial deposition of 20โ€‰nm AlN and 40โ€‰nm GaN, were examined by transmission electron microscopy. The lattice mismatched GaN/AlN and InN/GaN interfaces limited th