Improvement of metal gate/high-k dielectric CMOSFETs characteristics by atomic layer etching of high-k gate dielectric

✍ Scribed by Min, K.S.; Park, C.; Kang, C.Y.; Park, C.S.; Park, B.J.; Kim, Y.W.; Lee, B.H.; Lee, Jack C.; Bersuker, G.; Kirsch, P.; Jammy, R.; Yeom, G.Y.

• Book ID: 123006406
• Publisher: Elsevier Science
• Year: 2013
• Tongue: English
• Weight: 442 KB
• Volume: 82
• Category: Article
• ISSN: 0038-1101
• DOI: 10.1016/j.sse.2012.11.008