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Improvement of charge trapping characteristics of Al2O3/Al-rich Al2O3/SiO2 stacked films by thermal annealing

✍ Scribed by Nakata, Shunji; Kato, Takashi; Ozaki, Shinya; Kawae, Takeshi; Morimoto, Akiharu

Book ID: 122576635
Publisher: Elsevier Science
Year: 2013
Tongue: English
Weight: 462 KB
Volume: 542
Category: Article
ISSN: 0040-6090
DOI: 10.1016/j.tsf.2013.06.005

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