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Improvement in NBTI reliability of Si-passivated Ge/high-k/metal-gate pFETs

✍ Scribed by B. Kaczer; J. Franco; J. Mitard; Ph. J. Roussel; A. Veloso; G. Groeseneken

Publisher: Elsevier Science
Year: 2009
Tongue: English
Weight: 391 KB
Volume: 86
Category: Article
ISSN: 0167-9317
DOI: 10.1016/j.mee.2009.03.061

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