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Impact of Snapback Stress on the Degradation of ultra-short and Ultra-thin LDD NMOSFET

✍ Scribed by Hu Shigang; Wu Xiaofeng; Xi Zaifang

Book ID: 119354396
Publisher: Elsevier
Year: 2011
Tongue: English
Weight: 305 KB
Volume: 15
Category: Article
ISSN: 1877-7058
DOI: 10.1016/j.proeng.2011.08.832

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