Impact of nitrogen (N2+) implantation into polysilicon gate on thermal stability of cobalt silicide formed on polysilicon gate

✍ Scribed by Wein-Town Sun; Ming-Chi Liaw; Kuang-Chien Hsieh; Charles Ching-Hsiang Hsu

• Book ID: 114537417
• Publisher: IEEE
• Year: 1998
• Tongue: English
• Weight: 245 KB
• Volume: 45
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/16.711355