Transmission electron microscopy (TEM) and synchrotron radiation double-crystal topography (SRDT) have been employed to investigate Si/SiGe/Si heterostructures grown by ultra-high vacuum chemical vapor deposition (UHVCVD) on bonded Si-on-insulator (SOI) wafers. A configuration of misfit dislocation
Impact of misfit dislocations on wavefront distortion in Si/SiGe/Si optical waveguides
✍ Scribed by A. Trita; F. Bragheri; I. Cristiani; V. Degiorgio; D. Chrastina; D. Colombo; G. Isella; H. von Känel; F. Gramm; E. Müller; M. Döbeli; E. Bonera; R. Gatti; F. Pezzoli; E. Grilli; M. Guzzi; L. Miglio
- Publisher
- Elsevier Science
- Year
- 2009
- Tongue
- English
- Weight
- 526 KB
- Volume
- 282
- Category
- Article
- ISSN
- 0030-4018
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✦ Synopsis
Silicon-rich SiGe alloys represent a promising platform for the development of large-area single-mode optical waveguides to be integrated in silicon-based optical circuits. We find that SiGe layers epitaxially grown on Si successfully guide radiation with a 1.55 lm wavelength, but, beyond a critical core thickness, their optical properties are strongly affected by the clustering of misfit dislocations at the interface between Si and SiGe, leading to a significant perturbation of the local refractive index. Transmission electron microscopy and micro-Raman spectroscopy, together with finite-element simulations, provide a complete analysis of the impact of dislocations on optical propagation.
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Cathodoluminescence (CL) spectroscopy and CL imaging have been used to characterize misfit dislocations in as-grown Si/SiGe epilayers and those contaminated with transition metal. The misfit dislocations in the as-grown layers showed no radiative recombination (D bands) but only the band exciton fea