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Imaging by time-of-flight secondary ion mass spectrometry of plasma patterned metal and oxide thin films

✍ Scribed by G. Coullerez; J. Baborowski; C. Viornery; Y. Chevolot; N. Xanthopoulos; N. Ledermann; P. Muralt; N. Setter; H.J. Mathieu


Book ID
118569359
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
646 KB
Volume
203-204
Category
Article
ISSN
0169-4332

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