IIIB-5 Fabrication of thin gate Oxide MOSFET's using low-temperature plasma-enhanced chemical-vapor-deposited SiO2

✍ Scribed by Stasiak, J.; Batey, J.; Tierney, E.; Li, J.

• Book ID: 114596157
• Publisher: IEEE
• Year: 1987
• Tongue: English
• Weight: 168 KB
• Volume: 34
• Category: Article
• ISSN: 0018-9383
• DOI: 10.1109/t-ed.1987.23274