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[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - The role of boron segregation and transient enhanced diffusion on reverse short channel effect

โœ Scribed by Machala, C.; Wise, R.; Mercer, D.; Chatterjee, A.

Book ID
118273431
Publisher
IEEE
Year
1997
Tongue
English
Weight
292 KB
Volume
0
Category
Article
ISBN-13
9780780337756

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[IEEE SISPAD '97. 1997 International Con
[IEEE SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Cambridge, MA, USA (8-10 Sept. 1997)] SISPAD '97. 1997 International Conference on Simulation of Semiconductor Processes and Devices. Technical Digest - Accurate models for CMOS scaling and gate delay in deep sub-micron regime
โœ Kai Chen, ; Chenming Hu, ; Peng Fang, ; Gupta, A.; Ming Ren Lin, ; Wollesen, D.L ๐Ÿ“‚ Article ๐Ÿ“… 1997 ๐Ÿ› IEEE ๐ŸŒ English โš– 289 KB