𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - An analytical self-backgating GaAs MESFET model including deep-level trap effects

✍ Scribed by Lee, M.; Forbes, L.; Hallen, T.; Tuinenega, P.

Book ID: 118016006
Publisher: IEEE
Year: 1989
Weight: 316 KB
Volume: 0
Category: Article
DOI: 10.1109/iedm.1989.74287

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE International Technical Digest on

[IEEE International Technical Digest on Electron Devices Meeting - Washington, DC, USA (3-6 Dec. 1989)] International Technical Digest on Electron Devices Meeting - Low resistance ohmic contacts to two-dimensional electron-gas structures by selective MOVPE

✍ Solomon, P.M.; Palevski, A.; Kuech, T.F.; Tischler, M.A. 📂 Article 📅 1989 🏛 IEEE ⚖ 216 KB

[IEEE International Electron Devices Mee

[IEEE International Electron Devices Meeting. IEDM Technical Digest - Washington, DC, USA (7-10 Dec. 1997)] International Electron Devices Meeting. IEDM Technical Digest - RF MOSFET modeling accounting for distributed substrate and channel resistances with emphasis on the BSIM3v3 SPICE model

✍ Liu, W.; Gharpurey, R.; Chang, M.C.; Erdogan, U.; Aggarwal, R.; Mattia, J.P. 📂 Article 📅 1997 🏛 IEEE ⚖ 392 KB

[IEEE International Electron Devices Mee

[IEEE International Electron Devices Meeting 1991 [Technical Digest] - Washington, DC, USA (8-11 Dec. 1991)] International Electron Devices Meeting 1991 [Technical Digest] - The effect of metallic impurities on the dielectric breakdown of oxides and some new ways of avoiding them

✍ Verhaverbeke, S.; Meuris, M.; Mertens, P.W.; Heyns, M.M.; Philipossian, A.; Graf 📂 Article 📅 1991 🏛 IEEE ⚖ 367 KB

[IEEE Proceedings of IEEE International

[IEEE Proceedings of IEEE International Electron Devices Meeting - San Francisco, CA, USA (1989.12.3-1989.12.6)] International Technical Digest on Electron Devices Meeting - Physical model for the diffusion of ion implanted boron and BF/sub 2/ during rapid thermal annealing

✍ Kinoshita, ; Dim-Lee Kwong, 📂 Article 📅 1992 🏛 IEEE ⚖ 374 KB