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[IEEE IEEE 2000 International Interconnect Technology Conference - Burlingame, CA, USA (5-7 June 2000)] Proceedings of the IEEE 2000 International Interconnect Technology Conference (Cat. No.00EX407) - The investigation of galvanic corrosion in post-copper-CMP cleaning

✍ Scribed by Chen, H.C.; Yang, M.S.; Wu, J.Y.; Wang, V.

Book ID: 126697736
Publisher: IEEE
Year: 2000
Weight: 447 KB
Category: Article
ISBN-13: 9780780363274
DOI: 10.1109/IITC.2000.854341

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