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[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Studying shallow junction technology by atomistic modeling

✍ Scribed by Min Yu, ; Ru Huang, ; Xiaokang Shil, ; Huihui Jil, ; Xing Zhang, ; Yangyuan Wang, ; Hideki Oka,

Book ID: 126662982
Publisher: IEEE
Year: 2004
Weight: 296 KB
Category: Article
ISBN-13: 9780780381919
DOI: 10.1109/IWJT.2004.1306861

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