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[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Implant damage and diffusion behavior of indium in silicon-on-insulator

✍ Scribed by Chen, P.; An, Z.H.; Fu, R.K.Y.; Liu, W.L.; Zhu, M.; Lin, C.L.; Chu, P.K.

Book ID: 120018684
Publisher: IEEE
Year: 2004
Tongue: English
Weight: 243 KB
Category: Article
ISBN-13: 9780780381919
DOI: 10.1109/IWJT.2004.1306760

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