[IEEE Extended Abstracts of the Fourth International Workshop on Junction Technology - Shanghai, China (15-16 March 2004)] The Fourth International Workshop on Junction Technology, 2004. IWJT '04. - Temperature-dependent characteristics of diffused and polysilicon resistors for ULSI applications

✍ Scribed by Chii-Maw Uang, ; Hung-Ming Chuang, ; Shen -Fu, T.; Kong-Beng Thei, ; Po-Hsien Lai, ; Ssu-I Fu, ; Yan-Ying Tsai, ; Wen-Chau Liu,

• Book ID: 118264022
• Publisher: IEEE
• Year: 2004
• Tongue: English
• Weight: 236 KB
• Volume: 0
• Category: Article
• ISBN-13: 9780780381919
• DOI: 10.1109/iwjt.2004.1306860