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[IEEE 2013 IEEE International Electron Devices Meeting (IEDM) - Washington, DC, USA (2013.12.9-2013.12.11)] 2013 IEEE International Electron Devices Meeting - 2nd Generation dual-channel optimization with cSiGe for 22nm HP technology and beyond

✍ Scribed by Ortolland, C.; Jaeger, D.; Mcardle, T. J.; Dewan, C.; Robison, R. R.; Zhao, K.; Cai, J.; Chang, P.; Liu, Y.; Varadarajan, V.; Wang, G.; Chou, A. I.; Ioannou, D. P.; Oldiges, P.; Agnello, P.; Narasimha, S.; Narayanan, V.; Freeman, G.

Book ID: 121795836
Publisher: IEEE
Year: 2013
Weight: 341 KB
Category: Article
ISBN: 1479923060
DOI: 10.1109/IEDM.2013.6724594

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