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[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Uniaxially Strained Ge-Rich SiGe Nanowire Channel Technology for High-Performance CMOS

✍ Scribed by Ikeda, Keiji; Oda, Minoru; Irisawa, Toshifumi; Kamimuta, Yuuichi; Moriyama, Yoshihiko; Tezuka, Tsutomu

Book ID: 120068381
Publisher: IEEE
Year: 2012
Weight: 533 KB
Category: Article
ISBN: 1457718634
DOI: 10.1109/ISTDM.2012.6222446

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