𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Selective Epitaxial Phosphorus-Doped SiGe Layers for Short-Channel Effect Reduction

✍ Scribed by Park, Jeongwon; Balasubramanian, Ramachandran; Jain, Amitabh; Riley, Deborah; Juneja, Harpreet; Kuppurao, Satheesh

Book ID: 120067633
Publisher: IEEE
Year: 2012
Weight: 326 KB
Category: Article
ISBN: 1457718634
DOI: 10.1109/ISTDM.2012.6222452

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - SiGe Circuits for THz Applications

✍ Pfeiffer, U. R. 📂 Article 📅 2012 🏛 IEEE ⚖ 191 KB

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Recent Progress of Germanium Gate Stack Technology

✍ Toriumi, Akira; Lee, Choong Hyun; Tabata, Toshiyuki; Wang, Shengkai; Zhao, Danda 📂 Article 📅 2012 🏛 IEEE ⚖ 269 KB

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - 14 nm FinFET Stress Engineering with Epitaxial SiGe Source/Drain

✍ Choi, Munkang; Moroz, Victor; Smith, Lee; Penzin, Oleg 📂 Article 📅 2012 🏛 IEEE ⚖ 853 KB

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Uniaxially Strained Ge-Rich SiGe Nanowire Channel Technology for High-Performance CMOS

✍ Ikeda, Keiji; Oda, Minoru; Irisawa, Toshifumi; Kamimuta, Yuuichi; Moriyama, Yosh 📂 Article 📅 2012 🏛 IEEE ⚖ 533 KB

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Terahertz Imaging Using Strained-Si MODFETs as Sensors

✍ Meziani, Y. M.; Garcia-Garcia, E.; Velazquez-Perez, J. E.; Coquillat, D.; Dyakon 📂 Article 📅 2012 🏛 IEEE ⚖ 345 KB

[IEEE 2012 International Silicon-Germani

[IEEE 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - Berkeley, CA, USA (2012.06.4-2012.06.6)] 2012 International Silicon-Germanium Technology and Device Meeting (ISTDM) - High Performance Ge Photodetectors and Si Modulators for Integrated Photonics

✍ Vivien, Laurent; Marris-Morini, Delphine; Ziebell, Melissa; Rasigade, Gilles; Cr 📂 Article 📅 2012 🏛 IEEE ⚖ 717 KB