[IEEE 2012 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2012.06.12-2012.06.14)] 2012 Symposium on VLSI Technology (VLSIT) - Strain engineered extremely thin SOI (ETSOI) for high-performance CMOS

✍ Scribed by Khakifirooz, A.; Cheng, K.; Nagumo, T.; Loubet, N.; Adam, T.; Reznicek, A.; Kuss, J.; Shahrjerdi, D.; Sreenivasan, R.; Ponoth, S.; He, H.; Kulkarni, P.; Liu, Q.; Hashemi, P.; Khare, P.; Luning, S.; Mehta, S.; Gimbert, J.; Zhu, Y.; Zhu, Z.; Li, J.; Madan, A.; Levin, T.; Monsieur, F.; Yamamoto, T.; Naczas, S.; Schmitz, S.; Holmes, S.; Aulnette, C.; Daval, N.; Schwarzenbach, W.; Nguyen, B.-Y.; Paruchuri, V.; Khare, M.; Shahidi, G.; Doris, B.

• Book ID: 118144230
• Publisher: IEEE
• Year: 2012
• Weight: 324 KB
• Category: Article
• ISBN: 1467308455
• DOI: 10.1109/vlsit.2012.6242489