[IEEE 2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2012.05.15-2012.05.17)] 2012 SEMI Advanced Semiconductor Manufacturing Conference - Enhanced process control of pitch split double patterning by use of CD-SEM critical dimension uniformity and local overlay metrics

✍ Scribed by Halle, S. D.; Hotta, S.; Koay, C.; Chen, S.; Kato, T.; Yamaguchi, A.; Colburn, M.

• Book ID: 111962453
• Publisher: IEEE
• Year: 2012
• Weight: 952 KB
• Category: Article
• ISBN: 146730350X
• DOI: 10.1109/asmc.2012.6212920