[IEEE 2012 23rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) - Saratoga Springs, NY (2012.05.15-2012.05.17)] 2012 SEMI Advanced Semiconductor Manufacturing Conference - Experimental investigation and manufacturing solution of the rapid thermal process induced overlay residue

✍ Scribed by Weihua Tong, ; Kim, R.; Krishnan, B.; Sung Kim, ; Vatel, O.; Xuli Liu, ; Lei Huang, ; Suresh, K.; Miowchin Tan, ; Srinivasan, V.; Benyon, P.

• Book ID: 111962451
• Publisher: IEEE
• Year: 2012
• Weight: 599 KB
• Category: Article
• ISBN: 146730350X
• DOI: 10.1109/asmc.2012.6212915