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[IEEE 2011 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu, Taiwan (2011.04.25-2011.04.27)] Proceedings of 2011 International Symposium on VLSI Technology, Systems and Applications - IC process compatible anodic electrode structures for unipolar HfOx-based RRAM

✍ Scribed by Chen, W. S.; Chen, Y. S.; Hsu, Y. Y.; Yang, S. Y.; Liu, W. H.; Lee, H. Y.; Gu, P. Y.; Tsai, C. H.; Wang, S. M.; Chen, P. S.; Wang, Y. H.; Chen, F. T.; Tsai, M.-J.

Book ID: 123619756
Publisher: IEEE
Year: 2011
Weight: 386 KB
Category: Article
ISBN: 1424484936
DOI: 10.1109/VTSA.2011.5872249

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