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[IEEE 2010 IEEE Symposium on VLSI Technology - Honolulu, HI, USA (2010.06.15-2010.06.17)] 2010 Symposium on VLSI Technology - SiGe CMOS on (110) channel orientation with mobility boosters : Surface orientation, channel directions, and uniaxial strain

✍ Scribed by Oh, J.; Lee, S.-H.; Min, K.-S.; Huang, J.; Min, B.G.; Sassman, B.; Jeon, K.; Loh, W.-Y.; Barnett, J.; Ok, I.; Kang, C.-Y.; Smith, C.; Ko, D.-H.; Kirsch, P. D.; Jammy, R.

Book ID: 121284457
Publisher: IEEE
Year: 2010
Weight: 378 KB
Category: Article
ISBN: 1424454514
DOI: 10.1109/VLSIT.2010.5556127

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