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[IEEE 2008 IEEE International Conference on Computer Design (ICCD) - Lake Tahoe, CA, USA (2008.10.12-2008.10.15)] 2008 IEEE International Conference on Computer Design - ECO-Map: Technology remapping for post-mask ECO using simulated annealing

✍ Scribed by Modi, Nilesh A.; Marek-Sadowska, Malgorzata

Book ID: 126933762
Publisher: IEEE
Year: 2008
Tongue: English
Weight: 589 KB
Category: Article
ISBN: 142442657X
DOI: 10.1109/iccd.2008.4751930

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