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[IEEE 2007 IEEE International Interconnect Technology Conferencee - Burlingame, CA, USA (2007.06.4-2007.06.6)] 2007 IEEE International Interconnect Technology Conferencee - Strategies of RC Delay Reduction in 45 nm BEOL Technology

✍ Scribed by Kudo, H.; Ochimizu, H.; Tsukune, A.; Okano, S.; Naitou, K.; Sakamoto, M.; Takesako, S.; Shirasu, T.; Asneil, A.; Idani, N.; Sugimoto, K.; Ozaki, S.; Nakata, Y.; Owada, T.; Watatani, H.; Ohara, N.; Ohtsuka, N.; Sunayama, M.; Sakai, H.; Oryoji, M.; Akiyama, S.; Iwata, H.; Yamamoto, H.; Shimoda, Y.; Yao, T.; Suda, S.; Suzuki, T.; Sakai, S.; Kitada, H.; Amari, S.; Tabira, T.; Matsuura, A.; Iba, Y.; Mizushima, Y.; Matsuyama, H.; Suzuki, Y.; Shimizu, N.; Yanai, K.; Nakaishi, M.; Futatsugi, T.; Hanyu, I.; Nakamura, T.; Sugii, T.

Book ID: 121811749
Publisher: IEEE
Year: 2007
Weight: 476 KB
Category: Article
ISBN-13: 9781424410699
DOI: 10.1109/IITC.2007.382383

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