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[IEEE 2004 IEEE International SOI Conference - Charleston, SC, USA (4-7 Oct. 2004)] 2004 IEEE International SOI Conference (IEEE Cat. No.04CH37573) - Source/drain-doping engineering for optimal nanoscale FinFET design

✍ Scribed by Trivedi, V.P.; Fossum, J.G.

Book ID: 120177787
Publisher: IEEE
Year: 2004
Weight: 262 KB
Category: Article
ISBN-13: 9780780384972
DOI: 10.1109/SOI.2004.1391612

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