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[IEEE 2003 IEEE International Integrated Reliability Workshop Final Report - Lake Tahoe, CA, USA (20-23 Oct. 2003)] IEEE International Integrated Reliability Workshop Final Report, 2003 - Stress testing and characterization of high-k dielectric thin films

✍ Scribed by Luo, W.; Sunardi, D.; Kuo, Y.; Kuo, W.

Book ID: 120648092
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 428 KB
Category: Article
ISBN-13: 9780780381575
DOI: 10.1109/IRWS.2003.1283293

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