𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - A tool portfolio planning methodology for semiconductor wafer fabs

✍ Scribed by Chung-En Kao, ; Y-C Chou,

Book ID: 126737772
Publisher: IEEE
Year: 2000
Weight: 499 KB
Category: Article
ISBN-13: 9780780363748
DOI: 10.1109/SMTW.2000.883088

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE 2000 Semiconductor Manufacturing T

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - Photolithography area dispatching scheme for advanced technology in foundry fabs

✍ Kuang-Huan Hsu, ; Chieh-Chin Lan, 📂 Article 📅 2000 🏛 IEEE ⚖ 425 KB

[IEEE 2000 Semiconductor Manufacturing T

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - A cost-based heuristic for statistically determining sampling frequency in a wafer fab

✍ Chen-Fu Chien, ; Shao-Chung Hsu, ; Peng, S.; Chia-Hung Wu, 📂 Article 📅 2000 🏛 IEEE ⚖ 647 KB

[IEEE 2000 Semiconductor Manufacturing T

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - An effective SPC approach to monitoring semiconductor quality data with multiple variation sources

✍ Argon Chen, ; Ruey-Shan Guo, ; Pei-Chen Yeh, 📂 Article 📅 2000 🏛 IEEE ⚖ 253 KB

[IEEE 2000 Semiconductor Manufacturing T

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - SHEWMAC: an end-of-line SPC scheme via exponentially weighted moving statistics

✍ Chih-Min Fan, ; Shi-Chung Chang, ; Ruey-Shan Guo, ; Hui-Hung Kung, ; Jyh-Cheng Y 📂 Article 📅 2000 🏛 IEEE ⚖ 654 KB

[IEEE 2000 Semiconductor Manufacturing T

[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - Ultrathin (2.7 nm) oxy-nitride for suppressing boron penetration characterized by direct hole tunneling current in p+/pMOS

✍ Chih-hsing Yu, ; Ming-chen Chen, ; Min-hwa Chi, 📂 Article 📅 2000 🏛 IEEE ⚖ 487 KB

[IEEE 1998 Semiconductor Manufacturing T

[IEEE 1998 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (16-17 June 1998)] 1998 Semiconductor Manufacturing Technology Workshop (Cat. No.98EX133) - The design of rapid thermal process for large diameter applications [semiconductor wafer processing]

✍ Liu, C.W.; Lee, M.H.; Chao, C.Y.; Chen, C.Y.; Yang, C.C.; Chang, Y. 📂 Article 📅 1998 🏛 IEEE ⚖ 585 KB