[IEEE 2000 Semiconductor Manufacturing Technology Workshop - Hsinchu, Taiwan (14-15 June 2000)] 2000 Semiconductor Manufacturing Technology Workshop (Cat. No.00EX406) - Ultrathin (2.7 nm) oxy-nitride for suppressing boron penetration characterized by direct hole tunneling current in p+/pMOS

✍ Scribed by Chih-hsing Yu, ; Ming-chen Chen, ; Min-hwa Chi,

• Book ID: 126754979
• Publisher: IEEE
• Year: 2000
• Weight: 487 KB
• Category: Article
• ISBN-13: 9780780363748
• DOI: 10.1109/SMTW.2000.883090