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[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Gate oxide damage due to through the gate implantation in MOS-structures with ultrathin and standard oxides

✍ Scribed by Jank, M.P.M.; Lemberger, M.; Frey, L.; Ryssel, H.

Book ID: 126638344
Publisher: IEEE
Year: 2000
Weight: 457 KB
Category: Article
ISBN-13: 9780780364622
DOI: 10.1109/IIT.2000.924101

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