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[IEEE 1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual - Denver, CO, USA (8-10 April 1997)] 1997 IEEE International Reliability Physics Symposium Proceedings. 35th Annual - Interaction between water and fluorine-doped silicon oxide film deposited by PECVD

✍ Scribed by Yoshimaru, M.; Koizumi, S.; Shimokawa, K.; Ida, J.

Book ID: 126667143
Publisher: IEEE
Year: 1997
Weight: 736 KB
Category: Article
ISBN-13: 9780780335752
DOI: 10.1109/RELPHY.1997.584266

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