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[IEEE 1997 2nd International Workshop on Statistical Metrology - Kyoto, Japan (8 June 1997)] 1997 2nd International Workshop on Statistical Metrology - EWMA/SD: an end-of-line SPC scheme to monitor sequence-disordered data [semiconductor manufacturing]

✍ Scribed by Chih-Min Fan, ; Ruey-Shan Guo, ; Shi-Chung Chang,

Book ID: 126660760
Publisher: IEEE
Year: 1997
Weight: 389 KB
Category: Article
ISBN-13: 9780780337374
DOI: 10.1109/IWSTM.1997.629415

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