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[IEEE 1997 2nd International Workshop on Statistical Metrology - Kyoto, Japan (8 June 1997)] 1997 2nd International Workshop on Statistical Metrology - Rigorous statistical process variation analysis for quarter-μm CMOS with advanced TCAD metrology

✍ Scribed by Aoyama, K.; Kunitomo, H.; Tsuneno, K.; Sato, H.; Mori, K.; Masuda, H.

Book ID: 121335939
Publisher: IEEE
Year: 1997
Weight: 428 KB
Category: Article
ISBN-13: 9780780337374
DOI: 10.1109/IWSTM.1997.629401

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