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[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - On The Origin Of Tunneling Currents In Scaled Silicon Devices

✍ Scribed by Schenk, A.; Krumbein, U.; Muller, S.; Dettmer, H.; Fichtner, W.

Book ID: 126709520
Publisher: IEEE
Year: 1993
Weight: 207 KB
Category: Article
ISBN-13: 9780780313385
DOI: 10.1109/VPAD.1993.724737

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