𝔖 Bobbio Scriptorium

✦ LIBER ✦

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - A Non-local Formulation Of Impact Ionization For Silicon

✍ Scribed by Scrobohaci, P.; Ting-wei Tang,

Book ID: 126662359
Publisher: IEEE
Year: 1993
Weight: 165 KB
Category: Article
ISBN-13: 9780780313385
DOI: 10.1109/VPAD.1993.724774

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Solid Modeling-based Parametric Operations For Device Design

✍ Wong, W.T.; Yang, D.X.; Dutton, R.W.; Plummer, J.D. 📂 Article 📅 1993 🏛 IEEE ⚖ 182 KB

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - On The Origin Of Tunneling Currents In Scaled Silicon Devices

✍ Schenk, A.; Krumbein, U.; Muller, S.; Dettmer, H.; Fichtner, W. 📂 Article 📅 1993 🏛 IEEE ⚖ 207 KB

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - δ-zone Triangulation: A Boundary Refinement scheme for quadtree based mesh

✍ Yang, D.; Dutton, R.W.; Law, K.H. 📂 Article 📅 1993 🏛 IEEE ⚖ 189 KB

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - A System For 3 D Simulations Of Complex Si And Heterostructure Devices

✍ Conti, P.; Tomizawa, M.; Yoshii, A. 📂 Article 📅 1993 🏛 IEEE ⚖ 210 KB

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Analysis Of Collector Signal Delay In Bipolar Devices Using A Monte Carlo Method

✍ Tsuboi, Y.; Fiegna, C.; Sangiorgi, E.; Ricc, B.; Wada, T.; Katsumata, Y.; Iwai, 📂 Article 📅 1993 🏛 IEEE ⚖ 198 KB

[IEEE [1993 International Workshop on VL

[IEEE [1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Nara, Japan (May 14-15, 1993)] [Proceedings] 1993 International Workshop on VLSI Process and Device Modeling (1993 VPAD) - Consistent Quantitative Models For The Coupled Diffusion Of Dopants And Point Defects In Silicon

✍ Dunham, S.T. 📂 Article 📅 1993 🏛 IEEE ⚖ 347 KB