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[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Application of a pulsed, RF-driven, multicusp source for low energy plasma immersion ion implantation

✍ Scribed by Wengrow, A.B.; Leung, K.N.; Perkins, L.T.; Pickard, D.S.; Rickard, M.L.; Williams, M.D.; Tucker, M.

Book ID: 125481962
Publisher: IEEE
Year: 1997
Weight: 468 KB
Category: Article
ISBN-13: 9780780332898
DOI: 10.1109/IIT.1996.586559

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