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[IEEE 11th International Conference on Ion Implantation Technology - Austin, TX, USA (16-21 June 1996)] Proceedings of 11th International Conference on Ion Implantation Technology - Profile analysis of a 0.25 μm CMOS process

✍ Scribed by Current, M.I.; Castle, M.; Chia, V.; Mount, G.; Weinzierl, S.; Prussin, S.; Larson, L.

Book ID: 118065492
Publisher: IEEE
Year: 1997
Weight: 243 KB
Volume: 0
Category: Article
ISBN-13: 9780780332898
DOI: 10.1109/iit.1996.586182

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