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Hyperfine interaction and channeling studies of impurities implanted in silicon

✍ Scribed by H. De Waard; G.J. Kemerink


Publisher
Elsevier Science
Year
1983
Weight
564 KB
Volume
116
Category
Article
ISSN
0378-4363

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Cesium chloride-and rubidium chloride-promoted Rochow contact masses based on both technical-grade and highly pure silicon have been investigated in the Rochow reaction and by REM/EDX surface analysis. The alkali-salt promoters seem to act analogously to the wellknown zinc promoter, by localizing th