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Hydrogen induced changes on the electronic structure of carbon nitride films

โœ Scribed by P Hammer; N.M Victoria; F Alvarez


Book ID
117148860
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
151 KB
Volume
227-230
Category
Article
ISSN
0022-3093

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Amorphous carbon nitride films (a-CN x ) were deposited on Si(100) under different rf power and at different substrate temperature T S using rf magnetron sputtering of a high-purity graphite target in pure nitrogen. IR absorption, Raman spectra, and residual stress measurements are used to character