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Hydrogen diffusion mechanism in amorphous silicon from deuterium tracer studies

✍ Scribed by Howard M. Branz; Sally Asher; Brent P. Nelson; Mathieu Kemp


Book ID
115988994
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
306 KB
Volume
164-166
Category
Article
ISSN
0022-3093

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A number of alkylsilanes and alkylcarbosilanes of widely different molecular structure are characterized in terms of their ability to form amorphous hydrogenated silicon-carbon (a-Si:C:H) films in atomic hydrogen-induced chemical vapor deposition (AHCVD). The compounds containing only Si-C and C-H b