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Hydrofluoric acid etching of ultra thin silicon oxide film fabricated by high purity ozone

✍ Scribed by Ken Nakamura; Akira Kurokawa; Shingo Ichimura

Book ID: 114086706
Publisher: Elsevier Science
Year: 1999
Tongue: English
Weight: 375 KB
Volume: 343-344
Category: Article
ISSN: 0040-6090
DOI: 10.1016/s0040-6090(98)01658-7

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