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HREEL spectroscopy of thin ion beam deposited C:H(D) films

✍ Scribed by J. Biener; A. Schenk; B. Winter; J. Küppers

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
831 KB
Volume
64-65
Category
Article
ISSN
0368-2048

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An ion beam deposition system to produce isotopically pure epitaxial thin films of different materials has been designed and built. Using negative ions, problems due to mass interference with molecular ions could be significantly reduced, thus allowing the production, for instance, of 29 Si films of